(XSAF)
X-RAY SURFACE ANALYSIS FACILITY
The Western Australian XSAF provides access to a state of the art X-ray photoelectron spectroscopy system for studying surface elemental and chemical composition.


TECHNIQUES

 

X-ray photoelectron spectroscopy (XPS): monochromated Al (1486.7 eV) or Ag (2984.3 eV) X-ray sources, or flood Al/Mg source. Area or spot spectroscopy.

Glove box for sample mounting and inert housing for sample transfer.

XPS imaging: field of view 800×800 microns, resolution ~3-5 microns, chemical mapping.

Scanning electron microscopy (field emission source, resolution ~100-200 nm).

Auger electron spectroscopy and scanning auger microscopy (resolution ~200-500 nm), with chemical mapping.

Argon ion gun sputtering: monoatomic or cluster beam cleaning and depth profiling.

Ultra-violet photoelectron spectroscopy (He I and He II).

Ion scattering spectroscopy (He+ ions).

In-situ heating and cooling (-100°C to 600°C).

Electron neutraliser filament for insulating samples.

Gas/molecular dosing.

Provision for in-situ evaporation of materials (bring your own evaporator).

Residual gas analyser (quadrupole mass spectrometer sensor).

Angle-resolved depth profiling analysis.

MAIN INSTRUMENT

Kratos AXIS Ultra DLD X-ray photoelectron spectroscopy system with imaging hemispherical analyser, monochromated Al and Ag X-ray sources, Ag/Mg X-ray flood source, argon gas cluster ion gun, field emission electron source and ultra-violet helium lamp.

MAIN INSTRUMENT

Kratos AXIS Ultra DLD X-ray photoelectron spectroscopy system with imaging hemispherical analyser, monochromated Al and Ag X-ray sources, Ag/Mg X-ray flood source, argon gas cluster ion gun, field emission electron source and ultra-violet helium lamp.

APPLICATIONS

X-ray photoelectron spectroscopy (XPS) is a non-destructive technique used to probe the elemental and chemical composition of the first 2-5 nm of a sample surface. All elements heavier than helium can be detected down to an atomic concentration of 0.1-1%.

Soft Matter and Organic Chemistry

XPS has excellent sensitivity to light elements and is highly suited to studying the surface chemistry of soft organic systems – examples include molecular uptake on surfaces and the chemical composition of polymer films.

Materials Processing

Industrial and laboratory processing often changes the surface of materials. XPS is widely used to quantify the presence of adsorbed contaminants and/or chemical changes to the processed materials (e.g. oxidation).

Bonding and Electronic Structure

XPS spectra are highly sensitive to the bonding environment of the atoms in the sample. Properties such as oxidation state and highest occupied molecular orbital can be measured.

Delicate Samples

XPS requires no coating or special sample preparation, just that the sample be ultra-high vacuum compatible. The technique is non-destructive, though ion-gun sputtering can be used if desired to etch away a surface region and expose the bulk material.

Dr. Jean-Pierre Veder
XSAF
Facility Leader
Ph: +61 8 9266 1665
Prof. Craig Buckley
XSAF
Facility Co-Leader
Ph: +61 8 9266 3532